D07700 - SEMI D77 - Test Method for Measurements of Dimension of Films for FPD – Contour Matching Method Revision:SEMI D77-0618 - Superseded While this Document makes frequent

While this Document makes frequent reference to electrostatic fields and effects

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terms used to describe the characteristics of the edge profile of silicon wafers are named and their meaning is illustrated by a schematic drawing

and subcomponents of high purity gas distribution systems in a semiconductor fabrication facility

which will

D07700 - SEMI D77 - Test Method for Measurements of Dimension of Films for FPD – Contour Matching Method Revision:SEMI D77-0618 - Superseded While this Document makes frequentThis Standard establishes the method that evaluates with high precision a shape of the polarizing films and other films for FPD, especially non rectangle shape films. This Standard specifies the measurement method of polarizing films and other films for FPD by using contour matching method. This Standard can apply to rectangle shapes. Especially non rectangle shapes are effective. Examples of the other films except polarizing films are retardation