MF161700 - SEMI MF1617 - Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry StdTpc-Documentation/Training the test provides a basis

the test provides a basis for the reliability evaluation of raw material

SEMI G96-0126 (technical revision)

12-1102 (technical revision)

The model contained in this Specification documents features of the equipment structure considered necessary for more than one (current or future) Equipment Communication Standards

particles of the size of 5 to 10 nm range or low PPQ levels of metals) cannot currently be effectively measured in UPW

MF161700 - SEMI MF1617 - Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry StdTpc-Documentation/Training the test provides a basisNOTICE: This Document was reapproved with minor editorial changes. Secondary ion mass spectrometry (SIMS) can measure on polished silicon wafer product the following: the sodium and potassium areal densities that can affect voltage flatband shifts in integrated circuits, and, the aluminum areal density that can affect the thermal oxide growth rate. the iron areal density that can affect gate oxide integrity, minority carrier lifetime, and current