85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R: 16-19 ohm/sq, Nominal ITO film thickness: 90 nm+/10nm Hot Hot Press (eg: MSK-131-HS8) – www.hermes-technologie.de

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ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R: 16-19 ohm/sq, Nominal ITO film thickness: 90 nm+/10nm Hot Hot Press (eg: MSK-131-HS8)

$17.19

Quantity
Description

Hot Press (eg: MSK-131-HS8)

91 Array (Capacity):    5*8=40

100 ml vessel for a customized 6 reactors rotary oven

Size:                          4" diameter +/- 0

which can maintain chemical powder during tube rotating

ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R: 16-19 ohm/sq, Nominal ITO film thickness: 90 nm+/10nm Hot Hot Press (eg: MSK-131-HS8)Indium Tin Oxide (ITO) coated Glass Plates Dimension: 1" x 1" x 1. 1 mm Resistivity: 16 19ohm sq Nominal ITO film thickness: 90 nm+ 10nm Optical Transparency: > 85% @ 555nm Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

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